Most complex mask patterns do not have uniform CDs after optical proximity correction (OPC) or inverse lithography technology (ILT). Indeed, there are several challenges in mask metrology, ...

The resulting critical dimension variations were found to be approximately three times greater in line-and-space patterns than in contact hole patterns. Based on these findings, we recommend defining ...

Fu Mask PDF Pattern for Bane Mask The pocket on this mask can hold a regular mask (helping it to last longer), or in a serious pinch, I’ve read that a piece of vacuum cleaner bag can be used.